Revuele V&O Nourishing Mud Mask

Specifically formulated to nourish the skin in depth and keep it hydrated. Suitable for sensitive skin.
The combination of the natural ingredients Oat Oil, Chia Oil, Quinoa Extract, Kaolin and Rice flour deeply cleanses and nourishes the skin.
The high antioxidant content of Oat oil acts as a skin barrier from external factors such as UV radiation and pollution.
Chia Oil is a soothing, calming and nourishing skin oil which contains an exceptionally high concentration of alpha-linolenic, linoleic, oleic, stearic as well as palmitic acids, together with multiple vitamins, minerals and antioxidants.
Quinoa Extract is rich in essential fatty acids. They restore the skin’s barrier function, which helps keeping the skin hydrated and soft. The extract is a good source of lysine and methionine, both of which are amino acids playing a role in the synthesis of collagen – the protein that maintains the strength and firmness of skin.